Equilibrium shape of thermomigration Al-doped channels in Si wafers
Shirokov V.B., Seredin B.M., Timoshenko P.E., Kalinchuk V.V., Popov V.P., Malibashev A.V. Equilibrium shape of thermomigration Al-doped channels in Si wafers // Materials Science and Technology. — 2025. — 6 p. — DOI: 10.1177/02670836251371444. — EDN ZHIDYN
Количество авторов
6
Ссылка на публикацию в сети интернет
https://www.webofscience.com/wos/woscc/full-record/WOS:001564537700001, https://www.scopus.com/record/display.url?eid=2-s2.0-105024479640&origin=resultslist
https://elibrary.ru/item.asp?id=86694533
https://journals.sagepub.com/doi/10.1177/02670836251371444
https://journalrank.rcsi.science/ru/record-sources/details/14909/ - УБС 2
Год
2025