Optimizing Deposition Regimes to Fabricate VO2/TiO2/c-Al2O3 Thin Films for Active Metasurfaces

Kutepov M., Kaidashev V., Stryukov D., Konstantinov A., Mikheikin A., Nikolsky A., Kozakov A., Domaratskiy I., Alymov G., Kaidashev E. Optimizing Deposition Regimes to Fabricate VO2/TiO2/c-Al2O3 Thin Films for Active Metasurfaces // Physics and Mechanics of New Materials and Their Applications. 2023 International Conference (PHENMA 2023). Abstracts & Schedule / Surabaya, Indonesia, (03–08 October 2023). — Rostov-on-Don: Southern Federal University, 2023. — P. 176-177.— EDN: VATLUB.

Количество авторов
10

Ссылка на публикацию в сети интернет
https://elibrary.ru/item.asp?id=59820440

Год
2023