Optimizing deposition regimes to fabricate VO2/TiO2/c-Al2O3 thin films for active metasurfaces (Статья)

Kutepov M.E., Kaydashev V.E., Stryukov D.V., Konstantinov A.S., Mikheykin A.S., Nikolskiy A.V., Kozakov A.T., Morozov A.D., Kashchenko M.A., Alymov G.V., Kaidashev E.M. Optimizing deposition regimes to fabricate VO2/TiO2/c-Al2O3 thin films for active metasurfaces // Journal of Advanced Dielectrics. — 2024. — Vol. 14, No. 6, Art. No. 2340011. — P. 1–6. — DOI: 10.1142/s2010135x23400118. — EDN: UMGAAN